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Lecturer(s)
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Course content
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1. Introduction. Types of optical thin films, and characteristic information used for description. Inverse problems in the characterization of thin films. Numerical methods andcorrelation of parameters. 2. Optical characterization of thin films. Material models and the effect of the wavelength. 3. Calculation of the properties of single layer. Matrix methods for systems of thin layers. Spectral characterization. 4. Advanced spectroscopic techniques. Instrumentation for spectroscopy. Measurement of absolute transmission and reflection. 5. Polarization effects in thin films. Ellipsometryand spectroscopic ellipsometry. 6. Instrumentation for ellipsometry. Influence of substrate and measurement in a wide spectral range. 7. The surface morphology and scattering. Methods of mapping surface morphology - the techniques of optical microscopy (Nomarski, confocal microscopy), interference techniques (WLI), SEM, AFM and profilometry. 8. Mechanical properties of thin films. Microscopic and macroscopic characterization. Nanoindentation. Measurement of complex elastic modulus using AFM. Mechanical stress in the layer. Mathematical models and methods of measurement. 9. Identification of chemical composition. Microscopic and macroscopic techniques mapping chemical properties. LWIR and UV spectroscopy, XPS, AES, SIMS. Laboratory instrumentation and performance requirements substrates. 10. Crystallography of thin films. Monocrystalline, polycrystalline and amorphous layers. X-ray analysis and the influence of substrate. Electron diffraction (SEM, TEM). Tutorials: 1. Numerical Optimization and inverse problems. Examples in Matlab. 2. Numerical implementation of optical material models. Derivation of model parameters from the tabulated data. 3. Measurement of spectral characteristics of simple systems of thin films. 4. Identification of the properties of thin films from spectral data. 5. Spectroscopy in polarized light. Design of identification experiment. 6. Identification of unknown sample system of thin layers. 7. Identification of unknown sample system of thin layers. 8.Surface topology -optical scattering, microscopy (Nomarski, WLI, AFM). 9. Visit to the laboratory of crystallography. Identification of the crystalline phases of the samples. 10. Credit test. Identification of thin films systemfrom supplied data.
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Learning activities and teaching methods
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Monological explanation (lecture, presentation,briefing)
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Learning outcomes
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The course "Characterization of Thin Films" will present methods of characterization of thin optical layers in terms of optical, chemical and mechanical properties that are significant for applications in optical systems. Principles of these methods will be explained including their advantages and limitations.
Students acquire knowledge in the field of identification of optical thin films and their systems. The acquired knowledge will be focused mainly on the techniques and procedures necessary for the practical control and diagnostics of deposition processes. Students will gain knowledge in the field of spectroscopy and ellipsometry of thin films, AFM, SEM and WLI profilometry, mechanical analysis of thin films, chemical composition analysis anda crystallography of thin films. Principles of methods will be supplemented by knowledge of numeric identification of film parameters from data and a design of experimental methods for a robust identification of thin films.
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Prerequisites
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None
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Assessment methods and criteria
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Combined examination
Requirements for getting a credit are activity at the tutorials and successful passing of the tests. Examination iswritten and oral form.
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Recommended literature
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Karlík, M. Úvod do transmisní elektronové mikroskopie. České vysoké učení technické v Praze, 2011.
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Leach, R. Optical measurement of surface topography. Berlin: Springer, 2011.
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Macleod, HughAngus. Thin-film opticalfilters. CRC Press, 2001.
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Willey, Ronald R., ed. Practical design and productionofopticalthinfilms. CRC Press, 2002.
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