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Lecturer(s)
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Mokrý Pavel, prof. Ing. Ph.D.
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Václavík Jan, Ing. Ph.D.
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Course content
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1. Thin filmsin nature. History and motivation of using thin filmsin optics. Basic applications of thin films in optics. 2. Optical properties of solids. Metals and dielectrics. Interference on a thin layer. A quarter-wave rule and simple optical layers. 3. Matrix methods for analysisof thin filmsystems. Admitance diagrams. Analysis of AR and HR layers. 4. Metal thin films and dielectric thin films on metal substrates. Electric fields in thin layers. Effect of high intensity optical radiation. 5. Synthesis of thin film systems using matrix algebra and admittance diagrams. 6. Synthesis systems of thin film systems - reflectors, resonators and polarizers. Automated systems design, optimization methods "flip-flop" and "needle". 7. Methods for deposition of thin films. Chemical and physical methods. Typical properties of deposition methods, instrumentation and typical applications. 8.Technology for low pressure and vacuum deposition of thin films. 9. Control and diagnostics of deposition processes. 10. Characterization of thin films - optical properties, crystal structure, morphology and surface properties. Tutorials: 1. Electromagnetic waves in anisotropic environment. The propagation of an electromagnetic wave through interface between two materials. Analytical and numerical calculation. 1. Measurement of optical properties of materials. Transmission and reflection characteristics. 3. Numeric analysis of thin film systems. Impact of an angle and polarization of incident beam. 4. Construction of simple spectrometer and calibration of designed device. 5. Measurement of parameters of a thin film. 6. Synthesis of thin film systems - optimization according to desired optical characteristics. 7. Synthesis of thin film systems using automated software too. 8. Preparing data for production of thin film system. Motion system of thin layers with respect to manufacturability chosen deposition process. 9. Visit to the laboratory for vacuum deposition of optical thin films. 10. Credit test. Thin film system design and preparation of documentation for a production of thin film system.
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Learning activities and teaching methods
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Monological explanation (lecture, presentation,briefing)
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Learning outcomes
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The course will present the purpose of using thin layers in optical systems and achievable parameters of simple and complex multilayer systems. Methods and devices for design and characterization of simple thin film systems will be explained. The course is complemented by an overview of production technologies with a focus on low-pressure deposition of layers and means to control of the deposition processes.
Students acquire knowledge in the field of design, production and characterization of thin films for optical systems. Knowledge of the design include in particular the methods of mathematical analysis and synthesis of simple systems of thin layers and the use of numerical methods for the synthesis of complex systems. Knowledge of manufacturing processes include an overview of possible deposition methods and a deeper knowledge of vacuum evaporation and sputtering techniques, including control techniques for such deposition processes.
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Prerequisites
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N/A
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Assessment methods and criteria
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Combined examination
Requirements for getting a credit are activity at the tutorials and successful passing of the tests. Examination iswritten and oral form.
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Recommended literature
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Brooker, Geoffrey. Modern classical optics.. Oxford University Press, 2002.
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Macleod, HughAngus. Thin-film optical filters.. CRC Press, 2001.
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Willey, Ronald R., ed. Practical design and productionofopticalthinfilms. CRC Press, 2002.
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